Standard, electron beam and EUV lithography
For you we develop customized solutions in standard, electron beam and EUV lithography for assembly or integration into your application. For this we offer systems for beam shaping, beam homogenization or beam uniformization and zoom e.g. adjustment for microstructuring, steels as well as lens mask positioning or filter adjustment.
more than 10 years experience
magnet-free systems with lowest particle emission
cycles maintenance free
lubricated for the entire lifetime
and even higher repeatability.
with custom developments and controllers.
Configure the solution for your applications now
Inform us abour your exact requirements online, so that you can reach your targets as soon as possible.