DT200
Vacuum / Cleanroom rotary stages
782338:033.26
Aperture rotary stage
HV, DUV / EUV, cleanroom ISO 5, n x 360°, rep ± 0.001°, speed 109°/s, load 11 kg
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Options:
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Fields of application
Reflective surface inspection, transmitted light measurement, wafer alignment under reflection, transparent substrate inspection, glass wafer evaluation, thin-film thickness measurement, defect detection in reflective layers, wafer inspection, mask alignment, lens alignment, beam steering, fiber coupling, optical metrology, wafer bonding, die placement, mirror positioning, spectroscopy alignment, photolithography stages, polarization rotation
| 782338:033.26 | -DC-R | -DC-R-W | ||||
| Travel | [deg] | n x 360 | n x 360 | |||
| Repeatability unidirectional | [deg] | ± 0.002 | ± 0.001 | |||
| Repeatability bidirectional | [deg] | ± 0.014 | ± 0.002 | |||
| Accuracy | [deg] | ± 0.017 | ± 0.003 | |||
| Excentric runout | [µm] | ± 4 | ± 4 | |||
| Wobble | [µrad] | ± 25 | ± 25 | |||
| Positioning speed | [deg/s] | 73 | 47 | |||
| Max. Speed | [deg/s] | 109 | 70 | |||
| Max. acceleration | [deg/s2] | 1234 | 790 | |||
| Max. load Fz | [N] | 110 | 110 | |||
| Max. torque Mx, My | [N] | 16.6 | 16.6 | |||
| Max. torque Mz | [N] | 5.6 | 8.8 | |||
| Length | [mm] | 240 | 240 | |||
| Width | [mm] | 200 | 200 | |||
| Height | [mm] | 40 | 40 | |||
| Turntable | [Ø] | 170 | 170 | |||
| Aperture | [Ø] | 66 | 66 | |||
| Weight | [kg] | 4.0 | 4.0 | |||
| Bearing | Thin-section bearing | |||||
| Motor | DC Motor | |||||
| Transmission | Belt, Harmonic Drive | |||||
| Feedback | Motor Encoder, Dual loop: Angular Scale | |||||
| Surface Coating | Anodized Aluminum, Nickel | |||||
| Optional Features | Electrical and pneumatic rotary feed-through, superfinished turntable for optimum axial run-out, brake, rotation limiter, cable routing, reversing hard stop, sealing air, extraction system | |||||
| Versions for Cleanroom | Clean Room Class ISO 5 (higher on request) | |||||
| Versions for Radiation | EUV, DEV, UV (X-ray and gamma on request) | |||||
| Versions with Lower Magnetism | - | |||||
| Versions for Vacuum | - | |||||
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Overwiew standard stages Contact technical consultants
Elger Matthes
Consulting, Concepts, Innovation & Engineering
T +49 351 88585-82
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