DT155
Vacuum / Cleanroom rotary stages

782326:034.24

 

High-resolution rotary stage with large aperture

UHV, DUV / EUV, cleanroom ISO 6, n x 360°, rep 0.0003°, speed 300°/s, load 5 kg

  • Cleanroom: variants up to class ISO 6 (higher on request)
  • Vacuum: all ranges HV / UHV up to 10-11 mbar
  • Lubrication: liquid up to 10-8 mbar / dry up to 10-11 mbar
  • Max. Bakeout temperature: 100°C
Optionally configurable:
  • Available in magnetic and low magnetic versions (magnet-free on request)
  • Material selection and lubrication adapted to the application
  • Optional with controller FMC400/450
  • Customized development with 3D design, prototypes, series production

High precise and dynamic imaging

This compact and flat rotary stage achieves extremely high resolutions in vacuum during fast processes. Due to the large transmitted light of 79 mm / 3", even large samples can be precisely positioned, measured and analyzed. It can be combined into sophisticated multi-axis systems and can be easily controlled via our FMC 400/450 controllers.
 

Fields of application

High precision and dynamic microscopy e.g. electron microscope, ion microscope, scanning electron microscope, scanning tunneling microscope, beamline instrumentation, synchrotron, materials research, materials analysis, wafer inspection, semiconductor quality control, semiconductor research

 

DT155    -NM
Travel [deg]  n x 360
Repeatability unidirectional [deg] ± 0.0003
Repeatability bidirectional [deg] ± 0.0005
Positioning speed [deg/s] 200
Max. speed [deg/s] 300
Max. load Fx [N] 49
Length [mm] 200
Width [mm] 155
Height [mm] 35
Weight [kg] 1.7
Turntable [mm] Ø 150
Aperture [mm] Ø 79 (3")
Lubrication liquid [mbar] up to 10-8
Lubrication dry [mbar] up to 10-11
Max. Bakeout temperature [deg] 100
Motor   Nanomotion (Piezo)
Bearing   2 Thin-section bearings, stainless steel
Feedback   Angular Scale
Resolution Measuring system 0.00005°
Optional features   custom fluorine-free / PFAS-free UHV lubrication, adapter, bore grid, cable / plugs
Variants cleanroom  up to cleanroom class ISO 6 (higher on request)
Variants beam   UV, DUV, EUV (X-ray, gamma on request)
Variants magnetism magnetic, low-magnetic (magnet-free on request)
Variants vacuum    all ranges up to 10E-11 mbar HV / UHV

 

Your customized system

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Almost all atmospheric standard axes are anodized with UHV lubrication for residual pressures up to 10E-6 mbar - or even better - available. Click here for the overview of our standard axes!

Overwiew standard stages   Contact technical consultants

 

Only selected materials, components, and lubricants meet the requirements for low outgassing. In many cases, the use of liquid lubricants is not possible. In addition, the bake-out process places significant stress on the positioning system; thermal stresses occurring at temperatures of up to 140 °C must be taken into account.
All components are designed to be vacuum-compatible and are specially cleaned after manufacturing. Assembly is carried out under cleanroom conditions. For non-magnetic systems, the choice of materials is even more severely restricted.

We offer a wide range of solutions for both UHV systems with the highest performance requirements and non-magnetic assemblies.

The customized adaptation of our positioning systems to existing chambers or setups is carried out in several structured steps. The goal is seamless integration with maximum precision, cleanroom and/or vacuum compatibility, and operational reliability.

Typically, the customization process includes:

  • Analysis of the installation situation (available space, interfaces, loads, degrees of freedom, environmental conditions)
  • Application-specific alignment with respect to vacuum, cleanroom, magnetism, or radiation requirements
  • Mechanical adaptations such as custom adapters, base plates, hole patterns, or installation heights
  • Adaptation of drive, measurement, and cabling concepts, including connector routing, feedthroughs, and cable management
  • Material and lubricant selection tailored to outgassing behavior, particle requirements, and bake-out conditions


The system design is carried out using 3D design and simulation, optionally complemented by prototypes, functional testing, and cleanroom or vacuum preparation.

Our positioning systems are designed for various cleanroom classes in accordance with ISO 14644-1 and can be adapted to the specific application. As standard, we implement systems for ISO 6 to ISO 4. For particularly demanding custom applications—depending on system concept, motion, materials, and lubrication—cleanroom classes down to ISO 2–1 are also possible.

The achievable cleanroom class depends, among other factors, on:

  • the selected mechanics and bearing concept
  • the drive and measurement systems used
  • materials, surface treatments, and lubricants
  • motion profiles and operating conditions, e.g., enclosure and extraction
  • multi-level cleaning processes, handling, and commissioning

All cleanroom systems are appropriately prepared, assembled, and final-cleaned in a cleanroom environment. Upon request, we develop custom solutions precisely tailored to the required cleanroom class and application.

Nearly all atmospheric standard axes are available anodized with UHV lubrication for residual pressures down to 10E-6 mbar — or even better. For systems with stepper or piezo motors, we offer the following vacuum preparation:

  • All parts vacuum-cleaned
  • Liquid lubrication with UHV oil for pressures down to 10-6 mbar
  • Maximum bake-out temperature 80 °C
  • Equipped with Phytron stepper motors
  • Stainless steel components (ball screw, guides, bearings, screws)
  • Kapton or PTFE cabling
  • Kapton or ceramic Sub-D connectors
  • Untreated aluminum surfaces
  • Bores and cavities with venting holes, vented screws, or slotted washers
  • No covers
  • Assembled in our cleanroom
  • Final cleaned
  • Delivered in evacuated, double plastic packaging

 

Click here for more systems:
Overview of our standard axes

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Elger Matthes
Consulting, Concepts, Innovation & Engineering
T +49 351 88585-82
E-Mail

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