From the development of your idea to production - all at one location
Steinmeyer high-performance OEM solutions enable you to bring your customized solutions reliably to market with a customized infrastructure, services and a secure supply chain. Take advantage of all capacities at our location for development, parts manufacturing, micro-assembly, software, testing and certification.
More than 3.900 m2
Production area
Produce multiple series
more than 5,000 units.
More than 350 innovations
from different assemblies per year
Establish completely new technological standards with an innovative and application-experienced development team.
More than 150 years
experience as OEM partner
Shorten your time to market and provide better customer experiences.
One of the latest OEM developments from Steinmeyer Mechatronik is the DT232 - a rotary stage for monitoring tasks. Exemplifying many other OEM developments, the company designed a system to use a radar sensor to implement a monitoring device.
In close dialogue with the user, a cost-optimized solution with the rotary stage DT232 was created which would not have been possible simply by combining commercially available components.
For the task, a continuously running, flat rotary stage with large aperture was necessary. A direct drive was used to ensure long-term continuous operation. Motors with this design were not available. For cost reasons thin section bearings and angle measuring systems were not used. Instead, the motor and the angle measuring system have been integrated into a customized PCB assembly to realize the desired functionality in the given cost range.
Steinmeyer Mechatroniks plans to expand its capacities for OEM development and production in 2018 with further projects.
Extremely high resolution up to 0.1 µm, industrial-grade and cost-optimized
Scan up to 120 well plates per hour with single pipette or sensor (clean room class ISO6)
For scanners, microscopes and wafers up to 12 inch / 300 mm (clean room class ISO2)
Super fine XY-theta alignment of exposure masks with up to 0.03 µm (Ry)
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