DT155
Vacuum / Cleanroom rotary stages
782326:034.24
High-resolution rotary stage with large aperture
UHV, DUV / EUV, cleanroom ISO 6, n x 360°, rep 0.0003°, speed 300°/s, load 5 kg
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Optionally configurable:
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High precise and dynamic imaging
This compact and flat rotary stage achieves extremely high resolutions in vacuum during fast processes. Due to the large transmitted light of 79 mm / 3", even large samples can be precisely positioned, measured and analyzed. It can be combined into sophisticated multi-axis systems and can be easily controlled via our FMC 400/450 controllers.
Fields of application
High precision and dynamic microscopy e.g. electron microscope, ion microscope, scanning electron microscope, scanning tunneling microscope, beamline instrumentation, synchrotron, materials research, materials analysis, wafer inspection, semiconductor quality control, semiconductor research
DT155 | -NM | |
Travel | [deg] | n x 360 |
Repeatability unidirectional | [deg] | ± 0.0003 |
Repeatability bidirectional | [deg] | ± 0.0005 |
Positioning speed | [deg/s] | 200 |
Max. speed | [deg/s] | 300 |
Max. load Fx | [N] | 49 |
Length | [mm] | 200 |
Width | [mm] | 155 |
Height | [mm] | 35 |
Weight | [kg] | 1.7 |
Turntable | [mm] | Ø 150 |
Aperture | [mm] | Ø 79 (3") |
Lubrication liquid | [mbar] | up to 10-8 |
Lubrication dry | [mbar] | up to 10-11 |
Max. Bakeout temperature | [deg] | 100 |
Motor | Nanomotion (Piezo) | |
Bearing | 2 Thin-section bearings, stainless steel | |
Feedback | Angular Scale | |
Resolution Measuring system | 0.00005° | |
Optional features | custom fluorine-free / PFAS-free UHV lubrication, adapter, bore grid, cable / plugs | |
Variants cleanroom | up to cleanroom class ISO 6 (higher on request) | |
Variants beam | UV, DUV, EUV (X-ray, gamma on request) | |
Variants magnetism | magnetic, low-magnetic (magnet-free on request) | |
Variants vacuum | all ranges up to 10E-11 mbar HV / UHV |
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