EUV polarization filter for miniaturization in semiconductor lithography | Positioning system for wafer exposure in dry, oxygen-free pure nitrogen atmosphere
Precision Assemblies

782462:002.26

Yield maximization in the smallest possible construction space

This high-precision positioning system has been specifically designed as a complementary polarization filter for miniaturization and automation in EUV lithography. It maximizes the exposure quality as well as the yield of an existing wafer stepper in a very limited space of about 120 x 180 x 31 mm. For this purpose, three independently positionable filters are shifted in the optical system's beam path.It can be used for high-resolution processes under extreme environmental conditions, such as EUV and a dry as well as oxygen-free pure nitrogen atmosphere.

 

Optimizing accuracy in extreme environments

  • Ideal for miniaturization in automated EUV lithography
  • Maximizes yield and resolution of existing wafer stepper systems in smallest space (approx. 120 x 180 x 31 mm)
  • Accuracies up to 1.5 µm under most extreme environmental conditions: EUV, dry, oxygen-free pure nitrogen atmosphere
  • Maintenance-free and flexible 24/7 operation over many 1,000 positioning cycles, distributed over 10 years

Optionally expandable:

  • Different travels
  • Material selection and vacuum lubrication adapted to the application
  • Individual solutions for integration into the customer-specific application
  • Version for clean room ISO 14644-1 (up to class 1 on request)

Individual extensions and customizations

Engineering services include the fitting of the systems to your structure and the desired controlls. Furthermore, we develop prototypes and like to adapt the systems to the environmental requirements of your application particle emission, radiation, temperature, precision special parts manufacturing, working height, collision protection, safety concept, compensation factor and filter, sensor mounting, brake, decoupling, special lubrication, special colors, holders, adapters, special motors with pharmaceutical approval, comprehensive documentation, test protocoll, llife cycle tests

 

Fields of application

Miniaturization and automation in standard, electron beam and EUV lithography e.g. wafers, chips, die, pins, bonding, printed circuit boards, solar cells, solar panels, polarization sensitive photosensors as well as microstructuring, filter adjustment, measurement of polarization of incident light

782462:002.26

X1

X2

X3

Travel

[mm; deg]

76

76

76

Repeatability unidirectional

[µm; deg]

± 1.5

± 1.5

± 1.5

Repeatability bidirectional

[µm; deg]

± 5.5

± 5.5

± 5.5

Positioning Speed

[mm/s]

50

50

50

Max. Load

[N]

0.05

0.05

0.05

Motor

 

DC-Motor

DC-Motor

DC-Motor

Drive

 

Lead Screw

Lead Screw

Lead Screw

Feedback

Motor-Encoder

Motor-Encoder

Motor-Encoder

 

Specifications are subject to change. Values are for the single axis with our controller. Parameters shown here are typical values for a standard configuration. By customization and given in depth knowledge of your application significantly improved values can be achieved.


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Get your first 3D design in just a few days:

Dipl.-Ing. Elger Matthes

Phone: +49 (0) 351 88585-0

elger.matthes(at)steinmeyer.com