Double XY linear axis for high-precision adjustment of lenses for wafer steppers | ultra-fine UV exposure in the clean room
High precise adjustment of two optics
This high-precision double linear axis was developed especially for wafer steppers. Two lenses should be positioned relative to each other and also together with each other to realize even finer structures during UV exposure. This solution consists of two sliding axes on a common guide system. Two moving sliding carriages have three carriages each, which allows them to move partially within each other in order to bring the lenses together as closely as possible.
Ultrafine imaging in extremely dry environment
Detailed measurement protocols
This series assembly is manufactured many hundreds of times per year. All accuracy-relevant parameters are verified by a measuring stand after assembly. This measuring stand is located in the clean room and records accuracy, repeatability, straightness, flatness as well as current consumption. Additional checks are carried out to ensure minimal play in the bearings and smooth running of the drive system.
Individual extensions and customizations
Engineering services include the fitting of the systems to your structure and the desired controlls. Furthermore, we develop prototypes and like to adapt the systems to the environmental requirements of your application particle emission, radiation, temperature, precision special parts manufacturing, working height, collision protection, safety concept, compensation factor and filter, sensor mounting, brake, decoupling, special lubrication, special colors, holders, adapters, special motors with pharmaceutical approval, comprehensive documentation, test protocoll, llife cycle tests
High precision lens alignment, wafer alignment, wafer positioning, sensor alignment
|Repeatability unidirectional||[µm; deg]||± 1.5||± 1.5|
|Repeatability bidirectional||[µm; deg]||± 2.5||± 2.5|
|Positioning speed||[mm/s; deg/s]||100||100|
|Drive||Ball Screw||Ball Screw|